Andrew Feiring - Bis(fluoroalcohol) Monomers and Polymers: Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm", Feiring, A. E

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  Publication Details (including relevant citation   information): Bis(fluoroalcohol) Monomers and Polymers:   Improved Transparency Fluoropolymer Photoresists for   Semiconductor Photolithography at 157 nm", Feiring, A. E.,   Crawford, M. K.; Farnham, W. B.; French, R. H.; Leffew, K. W.;   Petrov, V. A.; Schadt III, Tran, H. V.; Zumsteg, F. C.   Macromolecules, 2006, 39, 1443

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