Andrew Feiring - Design of Very Transparent Fluoropolymer Resists for Semiconductor Manufacture at 157 nm", Feiring, A. E.; Crawford, M. K.; Farnham, W. B.; Feldman, J

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      Publication Details (including relevant citation   information): Design of Very Transparent Fluoropolymer   Resists for Semiconductor Manufacture at 157 nm", Feiring, A. E.;   Crawford, M. K.; Farnham, W. B.; Feldman, J.; French, R. H.;   Leffew, K. W.; Petrov, V. A.; Schadt, F. L.; Wheland, R. C.;   Zumsteg, F. C. J. Fluorine Chem., 2003, 122, 11

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