Andrew Feiring - "New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes.  Semiconductor Photoresists for Imaging at 157 and 193 nm", Feiring, A

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      Publication Details (including relevant citation   information): "New Amorphous Fluoropolymers of   Tetrafluoroethylene with Fluorinated and Non-Fluorinated   Tricyclononenes. Semiconductor Photoresists for Imaging at 157   and 193 nm", Feiring, A. E.; Crawford, M. K.; Farnham, W. B.;   Feldman, J.; French, R. H.; Junk, C. P.; Leffew, K. W.; Petrov,   V. A.; Qiu, W.; Schadt III, F. L.; Tran, H. V.; Zumsteg, F. C.   Macromolecules, 2006, 39, 3252.

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