Andrew Feiring - "Quantum Chemical Modeling for 157 nm Photolithography", Waterland, R. L.; Dobbs, K. D.; Rinehart, A. M.; Feiring, A. E.; Wheland, R. C.; Smart, B. E. J

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  Publication Details (including relevant citation   information): "Quantum Chemical Modeling for 157 nm   Photolithography", Waterland, R. L.; Dobbs, K. D.; Rinehart, A.   M.; Feiring, A. E.; Wheland, R. C.; Smart, B. E. J.Fluorine Chem.   2003, 122, 37

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