Publication Details (including relevant citation information):
Elsevier, Oxford, 2008
This book is devoted to modern and future applications of ion beam implantation technologies for polymer mate- rials. Modern ion beam sources have become cheaper and much more effective for use in industrial processes. This has given us the impetus to collect data on modification effects in polymer materials and to show different kinds of polymer processes where the ion beam implanter can offer new properties or solve technological problems. We consid- ered different kinds of applications from kitchen appliances such as dishwashers to high tech devices such as human organism implants or space constructions.
The book is written mostly from our original results (School of Physics at the University of Sydney, Australia; Rossendorf Research Center and Institute of Polymer Research, Dresden, Germany; and Institute of Technical Chemistry, Perm, Russia), and previous experience in ion beam implantation of polymers as well as basic physical and chemical knowledge related to this field are presented. We do not pretend that the scientific description of polymers and industrial polymer processes for ion beam technologies is by any means complete, and if readers can find other useful applications for ion beam implantation of polymers or solutions to any problems using ion beam implantation, we will be happy to hear from you.
Due to our attempts to present ion beam techniques for industry, we do not consider very high energy particle sources because of their cost. Our aim therefore is to concen- trate on low cost devices and systems which could be used even in small enterprises for production of special kinds of polymer material and polymer devices, where the ratio of “cost of equipment”/“cost of material” is not too high.
Research into high energy and big accelerators is chang- ing and it is now more common to find small and effective machines being used in research centers and universities. Researchers are now focusing on small ion beam implanters such as plasma immersion ion implanters (PIII) or Kaufman sources, which can be bought using a post-doctoral grant, for example. This, however, limits significantly the ion beam systems by ion energy and ion current. Such systems and their application are the subject of this book.
The book is written using our own experimental and the- oretical results as well as known literature data. We appreci- ate the help of our friends and colleagues, who contributed a great deal of knowledge and effort: Yuri Klyachkin, Valery Begishev, Nail Valeev, Viktor Trushnikov, Gennady Mesyats, Nikolay Gavrilov, Elsa Tereshatova, Sergey Lisenko, Valery Karmanov, Svetlana Astafyeva, Valentina Romanova, Irina Osorgina, Rustam Khaibullin, Reihard Guenzel, Manfred Maitz, Edgar Richter, Emily Pecheva, Galina Nechitailo, Alexander Mashinski, Vladimir Briskman, Stephane Langloise, Manfred Stamm, Pilip Volodin, Jan Weber, Bee Kwan Gan, David McKenzie and Irina Kondyurina.
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