James Hanson - "The 1.4 and 248 nm Radiation Response of Chemically Amplified Resists Containing Arylmethyl Sulfone Photoacid Generators" J.E. Hanson, D.A. Pingor, A

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      Publication Details (including relevant citation   information): "The 1.4 and 248 nm Radiation Response of   Chemically Amplified Resists Containing Arylmethyl Sulfone   Photoacid Generators" J.E. Hanson, D.A. Pingor, A.E. Novembre,   J.M. Kometani, W.W. Tai Polymers for Advanced Technology 1994, 5,   49-55.

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