Henry Hoff - GL Waytena, HA Hoff, IP Isaacson, ML Rebbert, DI Ma, Christie Marrian, and JS Suehle, The Optimization of the Double Mask System to Minimize the Conta

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      Publication Details (including relevant citation   information): GL Waytena, HA Hoff, IP Isaacson, ML   Rebbert, DI Ma, Christie Marrian, and JS Suehle, The Optimization   of the Double Mask System to Minimize the Contact Resistance of a   Ti/Pt/Au Contact, Journal of Electronic Materials, 26(2), 90-6   (1997), ISSN: 0361-5235 (Print) 1543-186X (Online), DOI:   10.1007/s11664-997-0094-8.

      Abstract: null

      Address (URL): http://www.springerlink.com/content/h3207l16128r4611/