Henry Hoff - GL Waytena, HA Hoff, DI Ma, IP Isaacson, ML Rebbert, Christie Marrian, and JS Suehle, The Use of a Double Mask System to Prevent Ti Diffusion from a Ti/Pt/Au Ohmic Contact on Diamond, J

Document created by Henry Hoff on Aug 22, 2014
Version 1Show Document
  • View in full screen mode

  Publication Details (including relevant citation   information): GL Waytena, HA Hoff, DI Ma, IP Isaacson,   ML Rebbert, Christie Marrian, and JS Suehle, The Use of a Double   Mask System to Prevent Ti Diffusion from a Ti/Pt/Au Ohmic Contact   on Diamond, J. Electrochem. Soc. 143(7), July, 2392-5 (1996),   ISSN: 0013-4651.

  Abstract: null

  Address (URL): http:// http://dx.doi.org/10.1149/1.1837013

 

Attachments

    Outcomes