Guy Hudson - L. Zhang, S. Raghavan, S. Meikle and G. Hudson, "Inhibition of Alumina Deposition during Tungsten Chemical Mechanical Planarization Through the Use of Citric Acid", J

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      Publication Details (including relevant citation   information): L. Zhang, S. Raghavan, S. Meikle and G.   Hudson, "Inhibition of Alumina Deposition during Tungsten   Chemical Mechanical Planarization Through the Use of Citric   Acid", J. Electrochem. Soc., Vol. 146, 4, pp. 1442-1447 (1999).

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