Lee Loewenstein - "Selective Etching of Silicon Nitride Using Remote Plasmas of CF4 and SF6," L.M. Loewenstein, J. Vac. Sci. Technol. A 7, 686 (1989).

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      Publication Details (including relevant citation   information): "Selective Etching of Silicon Nitride   Using Remote Plasmas of CF4 and SF6," L.M. Loewenstein, J. Vac.   Sci. Technol. A 7, 686 (1989).

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