Jeff Lince - Gouri Radhakrishnan and Jeffrey R. Lince, "Photolytic Deposition of Aluminum Nitride and Oxynitride Films at 350K" Journal of Electronic Materials, 25 (1996) 69

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  Publication Details (including relevant citation   information): Gouri Radhakrishnan and Jeffrey R. Lince,   "Photolytic Deposition of Aluminum Nitride and Oxynitride Films   at 350K" Journal of Electronic Materials, 25 (1996) 69.

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