Lee Loewenstein - "Effect of Oxygen on Fluorine Based Remote Plasma Etching of Silicon and Silicon Dioxide," L.M. Loewenstein, J. Vac. Sci. Technol. A 6, 1984 (1988).

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      Publication Details (including relevant citation   information): "Effect of Oxygen on Fluorine Based Remote   Plasma Etching of Silicon and Silicon Dioxide," L.M. Loewenstein,   J. Vac. Sci. Technol. A 6, 1984 (1988).

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