Lee Loewenstein - "In Situ Spectral Ellipsometry for Real-Time Thickness Measurement:  Etching Multilayer Stacks," S.A. Henck, W.M. Duncan, L.M. Loewenstein and S. Watts Butler, J

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  Publication Details (including relevant citation   information): "In Situ Spectral Ellipsometry for   Real-Time Thickness Measurement: Etching Multilayer Stacks," S.A.   Henck, W.M. Duncan, L.M. Loewenstein and S. Watts Butler, J. Vac.   Sci. Technol. A 11, 1179 (1993).

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