Lee Loewenstein - "Behavior of Metallic Contaminants During MOS Processing", T. Bearda, S. De Gendt, L.M. Loewenstein, M. Knotter, P.W. Mertens, M. Heyns, Ultra Clean Processing of Silicon Surfaces; Proc

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      Publication Details (including relevant citation   information): "Behavior of Metallic Contaminants During   MOS Processing", T. Bearda, S. De Gendt, L.M. Loewenstein, M.   Knotter, P.W. Mertens, M. Heyns, Ultra Clean Processing of   Silicon Surfaces; Proc. of the 4th Int. Symp. on Ultra Clean   Processing of Silicon, 11-14 (1999).

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