Publication Details (including relevant citation information): "Behavior of Metallic Contaminants During MOS Processing", T. Bearda, S. De Gendt, L.M. Loewenstein, M. Knotter, P.W. Mertens, M. Heyns, Ultra Clean Processing of Silicon Surfaces; Proc. of the 4th Int. Symp. on Ultra Clean Processing of Silicon, 11-14 (1999).