Lee Loewenstein - "Photoresist Stripping Using a Remote Plasma:  Chemical and Transport Effects," L.M. Loewenstein, C.H. Huffman, and C.J. Davis, in Plasma Processing and Synthesis of Materials, D

Version 1

      Publication Details (including relevant citation   information): "Photoresist Stripping Using a Remote   Plasma: Chemical and Transport Effects," L.M. Loewenstein, C.H.   Huffman, and C.J. Davis, in Plasma Processing and Synthesis of   Materials, D. Apelian and J. Szekely (ed.), Mat. Res. Soc. Symp.   Proc. 98, 267 272 (1987).

      Abstract: null

      Address (URL):