Robert Small - M.S. Thesis: "A Study of the Cation-Radicals of Certain Thio-Aromatic Compounds in Sulfuric Acid Solutions", Texas Tech University, 1965 Ph. D. Dissertation: "The Photolysis of Substituted Alkyl Ketoximes", University of Arizona, 1972

Version 1

      Publication Details (including relevant citation   information): M.S. Thesis: "A Study of the   Cation-Radicals of Certain Thio-Aromatic Compounds in Sulfuric   Acid Solutions", Texas Tech University, 1965 Ph. D. Dissertation:   "The Photolysis of Substituted Alkyl Ketoximes", University of   Arizona, 1972. "Ion Radicals. II. The ESR Spectra of   2,7-Dimethyl- and 2,7-Dichlorothianthrene in Concentrated   Sulfuric Acid." H. Shine, C. Dais, R. Small; J. Chemical Physics   38 p. 569 (1963). "Ion Radicals. IV. The Electron Spin Resonance   Spectra of Substituted Thianthrenes in Sulfuric Acid Solution."   H. Shine, R. Small, C. Dais; J. Organic Chemistry 29 p. 21   (1963). "Ion Radical VI. Phenoxathiin nd Phenoxathiin-5-oxide in   Sulfuric Acid." H. Shine, C. Dais, R. Small; J. Organic Chemistry   30 2140 (1964). "Pyrogenesis of Succinic Acid and Dimethylmaleic   Anhydride from Aspartic Acid." J. Patterson, B. Small, etc., J.   Organic Chemistry 41 3697 (1976). "Preparation of   2-Hydroxyethyldimethylamine Acylimides." R. Small, Organic Prep.   Proc. Int. 13(1) 55-58 (1981). "Critical Cleaning for   Semiconductor and Microdisplay Applications" M. Peterson, A.   Gorman, R. Small and Z. Chen; J. Microcont. Detection and Control   1(1) 33 (1998) "Using a Buffered Rinse Solution to Minimize Metal   Contamination after Wafer Cleaning" R. Small, M. Peterson, A.   Robles, D. Kempa and J. Knittel; MICRO, 16(1) p. 61-7, Jan. 1998   "Post Clean Treatment for Controlling Metal Corrosion and   Contamination on VLSI Structures": R. Small, M. Peterson, A.   Gorman and A. Robles; 17th Semiconductor Pure Water Conference,   p. 343-58, Santa Clara, CA. Mar. 2, 1998. "Post Clean Treatments   and Post CMP Solutions for Metal and Particle Removal from VLSI":   R. Small, M. Peterson, A. Gorman and Z. Chen; SEMICON China 98,   Shanghai, PRC, April 23, 1998. "The Use of Post Clean Treatments   for Reducing Metal Ion Contamination and Metal Corrosion on VLSI   Structures": R. Small, M. Peterson, A. Gorman, Z. Chen and J.   Steinmetz; 4th International Workshop on Advanced Pla

      Abstract: null

      Address (URL):