Publication Details (including relevant citation information):
J Marques-Hueso, R Abargues, J Canet-Ferrer, J L Valdes, J Martinez-Pastor (2010)MICROELECTRONIC ENGINEERING 87: 5-8. 1147-1149
In this work, the formation of silver metal nanoparticles inside a negative-tone resist based on poly(vinyl alcohol) is achieved by electron beam lithography. The chemistry of this sensitive resist allows the production of nanoparticles as well as the polymer crosslinking by the electron radiation. Due to the presence of the silver nanoparticles, the final composite exhibits a plasmonic behavior, which was characterized by measuring the absorbance. The lithographic properties of the resist have been characterized.
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