Publication Details (including relevant citation information):
Blakey, I.; Chen, L.; Dargaville, B.; Liu, H.; Whittaker, A.; Conley, W.; Piscani, E.; Rich, G.; Williams, A.; Zimmerman, P., Proc. SPIE 2007, 6519, 651909/1-651909/9.
A preliminary Quant. Structure Property Relationship (QSPR) model for predicting the refractive index of small mols. and polymers at 193 nm is presented. Although at this stage the model is only semiquant. we have found it useful for screening databases of com.-available compds. for high refractive index targets to include in our program of synthesis of high refractive index resist polymers. These resists are targeted for use in 2nd and 3rd generation 193 nm immersion lithog. Using this methodol. a range of targets were identified and synthesized via free radical polymn. Novel resist polymers were also synthesized via Michael addn. polymn. Preliminary dose to clear expts. identified a no. of promising candidates for incorporation into high refractive index resist materials. Furthermore, we have demonstrated imaging of a high index resist using water-based 193 nm immersion lithog
Address (URL): http://spie.org/x648.html?product_id=715108