Idriss Blakey - XPS and 19F NMR study of the photodegradation at 157 nm of photolithographic-grade Teflon AF thin films.

Version 1

      Publication Details (including relevant citation   information):

      Blakey, I.; George, G. A.; Hill, D. J. T.; Liu, H.; Rasoul, F.;   Whittaker, A. K.; Zimmerman, P.,  Macromolecules 2005, 38   (10), 4050-4053.

      DOI: 10.1021/ma047436+

      Abstract:

      Address (URL): http://pubs.acs.org/doi/abs/10.1021/ma047436%2B