Idriss Blakey - XPS and 19F NMR study of the photodegradation at 157 nm of photolithographic-grade Teflon AF thin films.

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  Publication Details (including relevant citation   information):

  Blakey, I.; George, G. A.; Hill, D. J. T.; Liu, H.; Rasoul, F.;   Whittaker, A. K.; Zimmerman, P.,  Macromolecules 2005, 38   (10), 4050-4053.

  DOI: 10.1021/ma047436+


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