Idriss Blakey - Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists.

Document created by Idriss Blakey on Aug 22, 2014
Version 1Show Document
  • View in full screen mode

  Publication Details (including relevant citation   information):

  Lawrie, K.; Blakey, I.; Blinco, J.; Gronheid, R.; Jack, K.;   Pollentier, I.; Leeson, M. J.; Younkin, T. R.; Whittaker, A. K.,   Radiat. Phys. Chem. 2011, 80 (2), 236-241.



  Poly(olefin sulfone)s, formed by the reaction of sulfur dioxide   (SO2)  and an olefin, are known to be highly   susceptible to degradation by  radiation and thus have been   identified as candidate materials for chain  scission-based   extreme ultraviolet lithography (EUVL) resist materials.  In   order to investigate this further, the synthesis and    characterisation of two poly(olefin sulfone)s namely   poly(1-pentene  sulfone) (PPS) and poly(2-methyl-1-pentene   sulfone) (PMPS), was achieved  and the two materials were   evaluated for possible chain scission EUVL  resist   applications. It was found that both materials possess high    sensitivities to EUV photons; however; the rates of outgassing   were  extremely high. The only observed degradation products   were found to be  SO2 and the respective olefin   suggesting that  depolymerisation takes place under   irradiation in a vacuum environment.  In addition to   depolymerisation, a concurrent conversion of SO2  moieties to a sulfide phase was observed using XPS.

  Address (URL):