Idriss Blakey - pplication of quantitative structure property relationship to the design of high refractive index 193i resist.

Document created by Idriss Blakey on Aug 22, 2014
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  Publication Details (including relevant citation   information):

  Liu, H.; Blakey, I.; Conley, W. E.; George, G. A.; Hill, D. J.   T.; Whittaker, A. K., A Journal of Micro/Nanolithography, MEMS,   and MOEMS 2008, 7 (2), 023001/1-023001/11.

  Abstract:

  A robust quantitative structure property  relationship   (QSPR) model with five parameters has been developed from    126 organic compounds for the prediction of refractive index at   589  nm.  The model and the knowledge of the refractive   index dispersion were  used in the rational design of new   materials for 193-nm immersion  lithography. The   significance of this model is that the structural    descriptors can be readily calculated and the factors that   significantly  affect refractive index can be easily   identified and used to guide the  selection of candidates.   Using this model, rapid screening of large  structure   databases is possible in order to find candidates. As an    example of this approach, the synthesis of the copolymer of   a  trithiocyclane-methacrylate derivative, identified by the   model, with  2-methyl adamantyl methacrylate is described.   The measured refractive  index of the copolymer at 589    nm agrees well with the value predicted  by the model. The   new polymer showed a 9.4% increase in refractive index  at   193  nm compared with the standard ArF resist.

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