Mariana Fraga - Effect of nitrogen content in amorphous SiCxNyOz thin films deposited by low temperature reactive magnetron co-sputtering technique

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  Publication Details (including relevant citation   information):

     H.S.   Medeiros, R.S. Pessoa, J.C. Sagás, M.A. Fraga, L.V. Santos,   H.S. Maciel, M. Massi, A.S. da Silva Sobrinho, M.E.H. Maia da   Costa. Effect   of nitrogen content in amorphous SiCxNyOz thin   films deposited by low temperature reactive magnetron   co-sputtering technique. Surface   and Coatings Technology, Volume 206, Issue 7, 25   December 2011, Pages 1787-1795

   

   

  Abstract:

  Address (URL): http://www.sciencedirect.com/science/article/pii/S0257897211009595

 

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