Mariana Fraga - Impact of high N2 flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Document created by Mariana Fraga on Jun 16, 2016
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  G. Leal, M. A. Fraga, L. A. Rasia, M. Massi. Surface and   Interface Analysis


    Because of their outstanding characteristics, diamond-like carbon   (DLC) thin films have been recognized as interesting materials   for a variety of applications. For this reason, the effects of   the incorporation of different elements on their fundamental   properties have been the focus of many studies. In this work,   nitrogen-incorporated DLC films were deposited on Si (100)   substrates by DC magnetron sputtering of a graphite target under   a variable N2 gas   flow rate in CH4 + N2 + Ar   gas mixtures. The influence of high N2 flow   ratios (20, 40 and 60%) on the chemical, structural and   morphological properties of N-DLC films was investigated.   Different techniques including field emission gun-equipped   scanning electron microscope (FEG-SEM), energy-dispersive X-ray   spectroscopy (EDS), atomic force microscopy (AFM), profilometry,   Rutherford backscattering spectrometry (RBS) and Raman   spectroscopy (325-nm and 514-nm excitation) were used to examine   the properties of the N-DLC films. Thus, the incorporation of   nitrogen was correlated with the morphology, roughness,   thickness, structure and chemical bonding of the films. Overall,   the results obtained indicate that the fundamental properties of   N-DLC films are not only related to the nitrogen content in the   film but also to the type of chemical bonds formed.

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