Publication Details (including relevant citation information):
Higo, M., Lu, X., Mazur, U., Hipps, K. W. Langmuir 1997 13 (23) 6176-6182
Abstract: Atomically smooth aluminum films with thicknesses of about 200 nm were prepared by vacuum evaporation of Al on heated mica substrates at 250 and 350 °C. Characterization of the films by transmission electron microscopy and transmission electron diffraction showed that the films consist of single crystals about 300 nm in diameter with the (111) face. The crystals are oriented randomly along the  direction perpendicular to the substrate. Atomic force microscopy observation of the films gave the morphology and roughness of the film surfaces. It was found that the faces of the crystals of the films formed at 250 and 350 °C are atomically smooth and the root-mean-square roughness of the film surfaces is about 0.6 nm over an area of 1 μm2.
Address (URL): http://dx.doi.org/10.1021/la9703959