Mariana Fraga - A Historical Overview of the Research on TiO2 Thin Films Deposited by Atomic Layer Deposition – Part I: Early Studies

Version 1

      Publication Details (including relevant citation   information):

      Chiappim Junior, William; Pessoa, Rodrigo; Amorim Fraga, Mariana;   Maciel, Homero Santiago (2017): A historical overview of the   research on TiO2 thin films deposited by atomic layer deposition   – Part I: Early Studies. figshare.

      https://doi.org/10.6084/m9.figshare.5469331.v2

      Abstract:

        Atomic Layer Epitaxy (ALE) or Atomic Layer Deposition (ALD) is a   gas-phase layer by layer deposition method which belongs to the   general class of Chemical Vapor Deposition (CVD) techniques, and   which has become of worldwide importance due to success in   down-scaling of microelectronic devices. Among the materials   obtained by the technique, titanium dioxide   (TiO2)   stands out due to its crystallographic importance and numerous   applications ranging from the photovoltaics to self-cleaning   surfaces. Here we present an overview of the history of   TiO2 thin   films grown by ALD technique organized into three periods: early   studies (1990s), consolidation period (2000s) and current stage   (2010-present). First, we report the early material synthesis and   characterization studies on ALD TiO2 thin   films during the 1990s. Then we address the evolution of the   research field from the 2000s until the present day. The purpose   of this historical survey is to synthetize the evolution of ALD   TiO2 thin   films technology for different applications, which could be   useful for students and researchers working in this field. In   this manuscript, Part I is presented reporting the first   published studies on TiO2thin   films deposited by ALD.

      Address (URL): https://figshare.com/articles/Manuscript_-_History_ALD_TiO2_part_I_-_v1_pdf/5469 331